GETec will be presenting various posters, which take a closer look at novel experiments, that can be conducted using the AFSEM®.
Furthermore we will be present at the booth of Quantum Design and would be happy to discuss with you, how AFSEM® can benefit your application.
The 7th International Workshop on Focused Electron Beam-Induced Processing, will be held in Modena
(Italy) from 10 to 13 of July 2018.
GETec is proud to be a gold sponsor at the FEBIP workshop in Modena.
Chris Schwalb will give a presentation on July 11th highlighting the AFSEM benefits for applications in
the field of focused electron beam-induced processing.
Let us meet you at our booth and discuss your application!
This event is organized by the European FIB network and is expecting participants from all over Europe.
It is an opportunity to share knowledge and experience in the field of Focused Ion Beam.
GETec will be presenting the AFSEM® and the unique benefits it can provide for your FIB system.
Please visit us at our booth and learn more about our product!
Since two of its main focuses are on Helium Ion Microscopy and correlative nanoanalytics, GETec will be presenting its ground-breaking, in-situ AFM solution for the Zeiss ORION Nanofab.
It enables interactive correlative analysis of your sample within the ORION Nanofab, without limiting the other tools of the microscope, since it can be adjusted to your specific helium ion microscope and application.
Meet us there and let’s discuss your application!
The Christian Doppler laboratory for direct fabrication of 3D nano probes explores a new type of 3D nanoprinting technology. The goal of this research programme is to enable new applications in the field of in-situ atomic force microscopy.
GETec Microscopy acts as an industrial partner and will use the anticipated 3D nano probes to further improve their in-situ AFM systems.
Chris Schwalb will be giving a talk on March 14th at the annual meeting of the DPG (Deutsche Physikalische Gesellschaft).
In his presentation he will mainly focus on correlative in-situ characterization of 3D nanostructures by combining SEM and AFM.
Furthermore GETec Microscopy will also be present at the accompanying exhibition. Feel free to visit us there to learn more about GETec Microscopy and AFSEM®. You can find us at the booth of LOTQuantumDesign.
Stefan Hummel was interviewed at the GrapheneForUS conference in New York.
Watch the interview above!
GETec Microscopy presented the leading solution for correlative in-situ AFM & SEM analysis (AFSEM) together with Quantum Design Inc. at the MRS fall meeting in Boston.
AFSEM® air was used to characterize a novel cell preparation method by two students Clemens Kemptner and Sarah Steiner, who work at the Johannes Kepler University Linz, Institute of Biophysics in the working group of
Prof. Andreas Ebner.
We are very proud to announce Mr. Kemptner and his work was awarded with a poster prize for PhD students and young researchers within the framework of the International School for “Electrochemical and acoustic methods in bioanalysis” (ELAMB 2017).
A new poster about “Correlative in-situ AFM & SEM & EDX & EBSD analysis of nanostructured
materials” by using our GETec microscopy’s AFSEM® was presented at the Microscopy Conference 2017 in Lausanne, Switzerland
