News

Since two of its main focuses are on Helium Ion Microscopy and correlative nanoanalytics, GETec will be presenting its ground-breaking, in-situ AFM solution for the Zeiss ORION Nanofab.

It enables interactive correlative analysis of your sample within the ORION Nanofab, without limiting the other tools of the microscope, since it can be adjusted to your specific helium ion microscope and application.

Meet us there and let’s discuss your application!

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The Christian Doppler laboratory for direct fabrication of 3D nano probes explores a new type of 3D nanoprinting technology. The goal of this research programme is to enable new applications in the field of in-situ atomic force microscopy.

GETec Microscopy acts as an industrial partner and will use the anticipated 3D nano probes to further improve their in-situ AFM systems.

Chris Schwalb will be giving a talk on March 14th at the annual meeting of the DPG (Deutsche Physikalische Gesellschaft).

In his presentation he will mainly focus on correlative in-situ characterization of 3D nanostructures by combining SEM and AFM.

Furthermore GETec Microscopy will also be present at the accompanying exhibition. Feel free to visit us there to learn more about GETec Microscopy and AFSEM®. You can find us at the booth of LOTQuantumDesign.

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Stefan Hummel was interviewed at the GrapheneForUS conference in New York.

Watch the interview above!

GETec Microscopy presented the leading solution for correlative in-situ AFM & SEM analysis (AFSEM) together with Quantum Design Inc. at the MRS fall meeting in Boston.

A new poster about “Correlative in-situ AFM & SEM & EDX & EBSD analysis of nanostructured
materials” by using our GETec microscopy’s AFSEM® was presented at the Microscopy Conference 2017 in Lausanne, Switzerland

At the Microanalysis and Microscopy Meeting in St.Louis, Missouri, a new poster focusing on the improved understanding of material behavior using our AFSEM® was presented.